• DocumentCode
    3535099
  • Title

    Silicon quantum-dot transistors operating above 100 K

  • Author

    Leobandung, E. ; Lingjie Guo ; Yun Wang ; Chou, S.Y.

  • Author_Institution
    Dept. of Electr. Eng., Minnesota Univ., Minneapolis, MN, USA
  • fYear
    1995
  • fDate
    19-21 June 1995
  • Firstpage
    48
  • Lastpage
    49
  • Abstract
    Reports the fabrication and characterization of unique silicon quantum-dot transistors (QDTs) that demonstrate quantum as well as single-electron Coulomb blockade effects at temperatures above 100 K. They are also the first Si transistors that show interference between different modes of quantum waves in a cavity. The transistors were fabricated on SIMOX (separation by implanted oxygen) silicon wafer with the top silicon layer 70 nm thick.
  • Keywords
    SIMOX; elemental semiconductors; quantum interference devices; semiconductor quantum dots; semiconductor technology; silicon; 70 nm; SIMOX; Si; quantum wave modes; quantum-dot transistors; semiconductor device characterization; semiconductor device fabrication; single-electron Coulomb blockade effects; Etching; Interference; Oxidation; Quantum dots; Shape; Silicon; Single electron transistors; Temperature; Tunneling; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference, 1995. Digest. 1995 53rd Annual
  • Conference_Location
    Charlottesville, VA, USA
  • Print_ISBN
    0-7803-2788-8
  • Type

    conf

  • DOI
    10.1109/DRC.1995.496265
  • Filename
    496265