• DocumentCode
    3535111
  • Title

    A low power 77 K nano-memory with single electron nano-crystal storage

  • Author

    Tiwari, S. ; Rana, F. ; Wei Chen ; Chan, K. ; Hanafi, H.

  • Author_Institution
    IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
  • fYear
    1995
  • fDate
    19-21 June 1995
  • Firstpage
    50
  • Lastpage
    51
  • Abstract
    We present experimental results of a threshold-shifting nano-memory. The observations are consistent with single electron storage in nano-crystals and offer possible evidence of Coulomb blockade at 77 K. The nano-memory consists of a silicon field-effect transistor with nano-crystals of silicon placed in the gate oxide in close proximity of the inversion surface. Electron charge is stored in these isolated 5-10 nm size nano-crystals which are separated from each other by >5 nm of SiO/sub 2/ and from the inversion layer on the substrate surface by sub-2 nm of SiO/sub 2/. Charge is injected from the inversion layer and its storage in the nano-crystals causes a shift in the threshold voltage which is sensed via current. The magnitude of this threshold shift is relatable to the charge in the nano-crystals, oxide thicknesses, and other device parameters. The uniqueness of this work is that this is the first memory utilizing single electron storage in a mainstream silicon technology which operates at low powers and yet does not sacrifice the drive current, reproducibility, and noise margin needs of a practical memory technology. It should also be possible to extend the concept to room temperature by utilizing the suspected Coulomb blockade behavior in nanocrystals of 3 nm size.
  • Keywords
    MOS memory circuits; cryogenic electronics; integrated circuit measurement; integrated circuit noise; inversion layers; nanotechnology; quantum interference devices; single electron transistors; 5 to 10 nm; 77 K; Coulomb blockade; Si-SiO/sub 2/; device parameters; drive current; field-effect transistor; gate oxide; inversion layer; inversion surface; noise margin; oxide thicknesses; reproducibility; single electron nanocrystal storage; threshold shift; threshold voltage; threshold-shifting nanomemory; Crystals; Current measurement; Current-voltage characteristics; Diodes; Electrical resistance measurement; Electrons; Nanoscale devices; Silicon; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference, 1995. Digest. 1995 53rd Annual
  • Conference_Location
    Charlottesville, VA, USA
  • Print_ISBN
    0-7803-2788-8
  • Type

    conf

  • DOI
    10.1109/DRC.1995.496266
  • Filename
    496266