DocumentCode
3535379
Title
High temperature enhancement-mode NMOS and PMOS devices and circuits in 6H-SiC
Author
Slater, D.B., Jr. ; Lipkin, L.A. ; Johnson, G.M. ; Suvorov, A.V. ; Palmour, J.W.
Author_Institution
Cree Res. Inc., Durham, NC, USA
fYear
1995
fDate
19-21 June 1995
Firstpage
100
Lastpage
101
Abstract
SiC devices are capable of operating at very high temperatures, allowing placement of electronics in high temperature ambients with limited cooling. The enhancement-mode MOSFET, used extensively in analog and digital circuits, has a particular advantage for high temperature operation because of its insulated gate. Research in this area has produced SiC n-channel depletion-mode devices/circuits and n-channel enhancement-mode digital gates operating from 25 to 300/spl deg/C. In this report, we demonstrate the first p-channel enhancement-mode MOSFETs and integrated circuits with good characteristics from 25 to 500/spl deg/C. The first enhancement-mode NMOS operational amplifier has also been fabricated and tested. The limited transconductance of SiC MOSFETs makes it difficult to produce sizable voltage gains without active loads. This work is focused on solving this problem by developing a potential SiC CMOS technology.
Keywords
CMOS integrated circuits; MOSFET; operational amplifiers; silicon compounds; wide band gap semiconductors; 25 to 500 C; 6H-SiC; NMOS devices; PMOS devices; SiC; SiC CMOS technology; SiC MOSFETs; enhancement-mode devices; high temperature ambients; integrated circuits; operational amplifier; p-channel MOSFETs; CMOS technology; Circuit testing; Digital circuits; Electronics cooling; Insulation; MOS devices; MOSFET circuits; Operational amplifiers; Silicon carbide; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference, 1995. Digest. 1995 53rd Annual
Conference_Location
Charlottesville, VA, USA
Print_ISBN
0-7803-2788-8
Type
conf
DOI
10.1109/DRC.1995.496288
Filename
496288
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