DocumentCode
3535919
Title
ESD induced latent defects in CMOS ICs and reliability impact
Author
Guitard, N. ; Trémouilles, D. ; Alves, S. ; Bafleur, M. ; Beaudoin, F. ; Perdu, P. ; Wislez, A.
Author_Institution
LAAS-CNRS, Toulouse, France
fYear
2004
fDate
19-23 Sept. 2004
Firstpage
1
Lastpage
8
Abstract
A dedicated test vehicle was designed to study the impact of ESD induced latent defects on digital and analog CMOS circuits. Both CDM and TLP stresses were applied to these circuits through a specific pad which allows stressing the circuit core. Both electrical characterization and non-destructive failure analysis were performed to locate the induced defect. For digital circuits, functionality is not affected although the IDDQ quiescent current increased. However, after burn-in and storage, it was observed that the IDDQ current significantly increased suggesting that the circuit lifetime is degraded. In contrast, even at very low stress level, the analog circuit exhibits a dramatic offset degradation and no recovery is observed after burn-in.
Keywords
CMOS analogue integrated circuits; CMOS digital integrated circuits; electrostatic discharge; failure analysis; integrated circuit reliability; stress analysis; CDM stress analysis; CMOS IC process; ESD-induced latent defects; IDDQ quiescent current; TLP stress analysis; digital-and-analog CMOS circuit; nondestructive failure analysis; offset degradation; Analog circuits; CMOS analog integrated circuits; CMOS digital integrated circuits; Circuit testing; Degradation; Digital circuits; Electrostatic discharge; Failure analysis; Stress; Vehicles;
fLanguage
English
Publisher
ieee
Conference_Titel
Electrical Overstress/Electrostatic Discharge Symposium, 2004. EOS/ESD '04.
Conference_Location
Grapevine, TX
Print_ISBN
978-1-5853-7063-4
Electronic_ISBN
978-1-5853-7063-4
Type
conf
DOI
10.1109/EOSESD.2004.5272615
Filename
5272615
Link To Document