Modifying interlayer coupling in CoFe/Bi/Co trilayer junction by post-annealing treatments

Author

Hsu, Jen-Hwa ; Sahu, Deepak ; Xue, Zhi-Long ; Sun, A.C. ; Chen, Cheng-Hsuan

Author_Institution

Dept. of Phys., Nat. Taiwan Univ., Taipei, Taiwan

fYear

2005

fDate

4-8 April 2005

Firstpage

1757

Lastpage

1758

Abstract

Trilayer structures CoFe/Bi/Co were prepared by dc sputtering at room temperature. The samples were then annealed at temperatures from 50°C to 250°C for 30 minutes. The crystalline structure, microstructures and magnetization loops of the as-deposited and annealed samples were investigated by X-ray diffraction, transmission electron microscopy (TEM) and vibrating sample magnetometer respectively. The correlation of interface parameters with interlayer coupling was analyzed and presented as function of the different annealing temperatures.

Keywords

X-ray diffraction; annealing; bismuth; cobalt; cobalt alloys; crystal microstructure; crystal structure; ferromagnetic materials; interface roughness; iron alloys; magnetic multilayers; magnetisation; sputter deposition; transmission electron microscopy; 20 to 25 degC; 30 min; 50 to 250 degC; CoFe-Bi-Co; X-ray diffraction; annealing temperatures; crystalline structure; dc sputtering; interface parameters; interlayer coupling; magnetization loops; microstructures; postannealing treatments; room temperature; transmission electron microscopy; trilayer junction; vibrating sample magnetometer; Annealing; Bismuth; Crystal microstructure; Crystallization; Electrons; Magnetic force microscopy; Magnetization; Sputtering; Temperature; X-ray diffraction;

fLanguage

English

Publisher

ieee

Conference_Titel

Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International

Print_ISBN

0-7803-9009-1

Type

conf

DOI

10.1109/INTMAG.2005.1464312

Filename

1464312