• DocumentCode
    3541271
  • Title

    P-type Si nanocrystal thin-film transistor

  • Author

    Zhou, Xin ; Rafiq, M.A. ; Mizuta, Hiroshi ; Oda, Shunri

  • Author_Institution
    Quantum Nanoelectron. Res. Center, Tokyo Inst. of Technol., Tokyo, Japan
  • fYear
    2008
  • fDate
    15-16 June 2008
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    In this paper, the authors present p-type thin-film transistors based on size-controlled Si nanocrystals dispersed on SiO2 matrix. We demonstrate that the influence of Al/Si nanocrystals contacts on thin film transistor characteristics.
  • Keywords
    CVD coatings; elemental semiconductors; nanostructured materials; silicon; silicon compounds; thin film transistors; Si; SiO2; chemical vapour deposition; nanocrystals contacts; p-type nanocrystal thin-film transistor; Artificial intelligence; Conductivity; Control systems; Electrodes; Nanocrystals; Oxidation; Silicon; Size control; Substrates; Thin film transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Silicon Nanoelectronics Workshop, 2008. SNW 2008. IEEE
  • Conference_Location
    Honolulu, HI
  • Print_ISBN
    978-1-4244-2071-1
  • Type

    conf

  • DOI
    10.1109/SNW.2008.5418428
  • Filename
    5418428
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3541271