• DocumentCode
    3542443
  • Title

    Effect of growth temperature on the material properties of PLD-grown Bi2Te3 and Sb2Te3

  • Author

    Shaik, Muneer ; Motaleb, Ibrahim Abdel

  • Author_Institution
    Dept. of Electr. Eng., Northern Illinois Univ., DeKalb, IL, USA
  • fYear
    2013
  • fDate
    9-11 May 2013
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    Bismuth Telluride (Bi2Te3) and Antimony Telluride (Sb2Te3) are the preferable materials for building thermoelectric devices. Pulsed Laser Deposition (PLD) is one of the techniques used to grow these materials. To study the effect of temperature growth on the properties of the materials, thin films were PLD-deposited on n-type Silicon substrate in Argon (Ar) atmosphere. Substrate temperatures changed from 25 °C to 450 °C. The surface morphology of the films was studied using Atomic Force Microscopy (AFM) and their crystal properties were studied using X-ray Diffraction (XRD) analysis. The effect of the growth temperature on the material properties was investigated. AFM scans show how temperature affects the surface morphology. XRD results show that all the films are polycrystalline, and at higher temperatures both films have specific preferred orientations, namely along the (006) and (00 15) planes. Both Bi2Te3 and Sb2Te3 were found to have hexagonal crystal lattice structure with lattice constants a = 4.396 Å and c = 30.486 Å for Bi2Te3 and a = 5.075 Å and c = 30.451 Å for Sb2Te3. The grain sizes of all the films were calculated using Scherrer formula and plotted as a function of temperature for both the materials.
  • Keywords
    X-ray diffraction; antimony compounds; atomic force microscopy; bismuth compounds; grain size; lattice constants; pulsed laser deposition; surface morphology; texture; thin films; AFM; Bi2Te3; Sb2Te3; Scherrer formula; Si; X-ray diffraction; XRD; atomic force microscopy; grain sizes; hexagonal crystal lattice structure; lattice constants; preferred orientations; pulsed laser deposition; surface morphology; temperature 25 degC to 450 degC; thin films; Films; Grain size; Substrates; Surface morphology; Surface treatment; Temperature; X-ray diffraction; AFM; Bi2Te3; PLD; Sb2Te3; Scherrer formula; Substrate temperature; XRD;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electro/Information Technology (EIT), 2013 IEEE International Conference on
  • Conference_Location
    Rapid City, SD
  • ISSN
    2154-0357
  • Print_ISBN
    978-1-4673-5207-9
  • Type

    conf

  • DOI
    10.1109/EIT.2013.6632706
  • Filename
    6632706