DocumentCode
3542443
Title
Effect of growth temperature on the material properties of PLD-grown Bi2 Te3 and Sb2 Te3
Author
Shaik, Muneer ; Motaleb, Ibrahim Abdel
Author_Institution
Dept. of Electr. Eng., Northern Illinois Univ., DeKalb, IL, USA
fYear
2013
fDate
9-11 May 2013
Firstpage
1
Lastpage
6
Abstract
Bismuth Telluride (Bi2Te3) and Antimony Telluride (Sb2Te3) are the preferable materials for building thermoelectric devices. Pulsed Laser Deposition (PLD) is one of the techniques used to grow these materials. To study the effect of temperature growth on the properties of the materials, thin films were PLD-deposited on n-type Silicon substrate in Argon (Ar) atmosphere. Substrate temperatures changed from 25 °C to 450 °C. The surface morphology of the films was studied using Atomic Force Microscopy (AFM) and their crystal properties were studied using X-ray Diffraction (XRD) analysis. The effect of the growth temperature on the material properties was investigated. AFM scans show how temperature affects the surface morphology. XRD results show that all the films are polycrystalline, and at higher temperatures both films have specific preferred orientations, namely along the (006) and (00 15) planes. Both Bi2Te3 and Sb2Te3 were found to have hexagonal crystal lattice structure with lattice constants a = 4.396 Å and c = 30.486 Å for Bi2Te3 and a = 5.075 Å and c = 30.451 Å for Sb2Te3. The grain sizes of all the films were calculated using Scherrer formula and plotted as a function of temperature for both the materials.
Keywords
X-ray diffraction; antimony compounds; atomic force microscopy; bismuth compounds; grain size; lattice constants; pulsed laser deposition; surface morphology; texture; thin films; AFM; Bi2Te3; Sb2Te3; Scherrer formula; Si; X-ray diffraction; XRD; atomic force microscopy; grain sizes; hexagonal crystal lattice structure; lattice constants; preferred orientations; pulsed laser deposition; surface morphology; temperature 25 degC to 450 degC; thin films; Films; Grain size; Substrates; Surface morphology; Surface treatment; Temperature; X-ray diffraction; AFM; Bi2 Te3 ; PLD; Sb2 Te3 ; Scherrer formula; Substrate temperature; XRD;
fLanguage
English
Publisher
ieee
Conference_Titel
Electro/Information Technology (EIT), 2013 IEEE International Conference on
Conference_Location
Rapid City, SD
ISSN
2154-0357
Print_ISBN
978-1-4673-5207-9
Type
conf
DOI
10.1109/EIT.2013.6632706
Filename
6632706
Link To Document