• DocumentCode
    3546179
  • Title

    Decomposition of perfluorooctane sulfonate in water using multiple plasmas

  • Author

    Obo, Hayato ; Takeuchi, N. ; Yasuoka, Koichi

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Tokyo Inst. of Technol., Tokyo, Japan
  • fYear
    2013
  • fDate
    16-21 June 2013
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    In recent years, restraining and reduction of the use of perfluorocompounds (PFCs) have been required as a result of rising of environmental awareness. Perfluorooctanesulfonic acid (PFOS): one of the PFCs, is widely used for industrial and commercial products such as foam fire-extinguisher and coating agents for semiconductors because of its chemical stability and physical characteristics. However, PFOS is remarkably stable and remain in the environment. Moreover, PFOS is not decomposed by conventional methods such as advanced oxidation process (AOP), which involves the use of hydroxyl radicals. Although PFOS have been decomposed by photochemical decomposition, the energy efficiency and decomposition rate are challenges.
  • Keywords
    decomposition; energy conservation; environmental factors; organic compounds; oxidation; plasma; reduction (chemical); stability; water; AOP; PFC usage reduction; PFOS; advanced oxidation process; chemical stability; coating agents; commercial products; energy efficiency; foam fire extinguisher; industrial products; multiple plasmas; perfluorocompound; perfluorooctane sulfonate; perfluorooctanesulfonic acid; photochemical decomposition; water; Coatings; Electrodes; Electronic ballasts; Energy efficiency; Inductors; Plasmas; Resistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
  • Conference_Location
    San Francisco, CA
  • ISSN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2013.6633434
  • Filename
    6633434