DocumentCode
3546179
Title
Decomposition of perfluorooctane sulfonate in water using multiple plasmas
Author
Obo, Hayato ; Takeuchi, N. ; Yasuoka, Koichi
Author_Institution
Dept. of Electr. & Electron. Eng., Tokyo Inst. of Technol., Tokyo, Japan
fYear
2013
fDate
16-21 June 2013
Firstpage
1
Lastpage
1
Abstract
In recent years, restraining and reduction of the use of perfluorocompounds (PFCs) have been required as a result of rising of environmental awareness. Perfluorooctanesulfonic acid (PFOS): one of the PFCs, is widely used for industrial and commercial products such as foam fire-extinguisher and coating agents for semiconductors because of its chemical stability and physical characteristics. However, PFOS is remarkably stable and remain in the environment. Moreover, PFOS is not decomposed by conventional methods such as advanced oxidation process (AOP), which involves the use of hydroxyl radicals. Although PFOS have been decomposed by photochemical decomposition, the energy efficiency and decomposition rate are challenges.
Keywords
decomposition; energy conservation; environmental factors; organic compounds; oxidation; plasma; reduction (chemical); stability; water; AOP; PFC usage reduction; PFOS; advanced oxidation process; chemical stability; coating agents; commercial products; energy efficiency; foam fire extinguisher; industrial products; multiple plasmas; perfluorocompound; perfluorooctane sulfonate; perfluorooctanesulfonic acid; photochemical decomposition; water; Coatings; Electrodes; Electronic ballasts; Energy efficiency; Inductors; Plasmas; Resistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
Conference_Location
San Francisco, CA
ISSN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2013.6633434
Filename
6633434
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