DocumentCode
3552750
Title
A reduction camera for exposure of microcircuitry onto wafers
Author
Wilczynski, J.S. ; Tibbetts, R.E. ; Harper, J.S. ; Santy, W.G.
Author_Institution
IBM-Watson Research Center, Yotktown Heights, N. Y.
Volume
13
fYear
1967
fDate
1967
Firstpage
146
Lastpage
146
Abstract
Considerable improvement in yield may be expected from projection exposure of wafers, since the mask defects may be virtually eliminated and some of the diffraction problems associated with contact printing minimized. The described system, developed over the past two years, consists of a 1000-W Hg arc with a 4047Å concentric interference filter, 360 mm in diameter 4 element condenser of 0.80NA with one aspheric, a diffraction limited F/3.0 lens working at 10 times reduction, covering 32 mm dia field and a wafer alignment station.
Keywords
Application specific integrated circuits; Cameras; Crystalline materials; Fabrication; Image generation; Integrated optics; Lenses; Optical design techniques; Optical filters; Photonic integrated circuits;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1967 International
Type
conf
DOI
10.1109/IEDM.1967.187910
Filename
1474991
Link To Document