DocumentCode
3553252
Title
DSA enhancement - Depletion MOS IC
Author
Tarui, Y. ; Hayashi, Y. ; Sekigawa, Toshihiro
Author_Institution
Electrotechnical Laboratory, Tokyo, Japan
fYear
1970
fDate
28-30 Oct. 1970
Firstpage
110
Lastpage
110
Abstract
To achieve high-speed and low-power logic, MOS integrated circuits with submicron effective channel length have been constructed. In the diffusion self-aligned structure, the effective channel is determined by the length of impurity side-diffusion. The same diffusion is effectively utilized to make an enhancement-mode MOST for the amplifier and to leave the load MOST in depletion mode. This enhancement-depletion composition has the merits of low supply voltage (down to 1.5 V) and high speed. Furthermore, in this configuration the noise margin to NFB is insensitive to variation of the gate-oxide thickness and has a wide allowance for the surface concentration of the diffused base layer.
Keywords
Breakdown voltage; Fabrication; Feedback amplifiers; High speed integrated circuits; Integrated circuit noise; Laboratories; Logic circuits; Low voltage; MOS integrated circuits; MOSFETs;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1970 International
Conference_Location
Washington, DC, USA
Type
conf
DOI
10.1109/IEDM.1970.188299
Filename
1476411
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