• DocumentCode
    3553252
  • Title

    DSA enhancement - Depletion MOS IC

  • Author

    Tarui, Y. ; Hayashi, Y. ; Sekigawa, Toshihiro

  • Author_Institution
    Electrotechnical Laboratory, Tokyo, Japan
  • fYear
    1970
  • fDate
    28-30 Oct. 1970
  • Firstpage
    110
  • Lastpage
    110
  • Abstract
    To achieve high-speed and low-power logic, MOS integrated circuits with submicron effective channel length have been constructed. In the diffusion self-aligned structure, the effective channel is determined by the length of impurity side-diffusion. The same diffusion is effectively utilized to make an enhancement-mode MOST for the amplifier and to leave the load MOST in depletion mode. This enhancement-depletion composition has the merits of low supply voltage (down to 1.5 V) and high speed. Furthermore, in this configuration the noise margin to NFBis insensitive to variation of the gate-oxide thickness and has a wide allowance for the surface concentration of the diffused base layer.
  • Keywords
    Breakdown voltage; Fabrication; Feedback amplifiers; High speed integrated circuits; Integrated circuit noise; Laboratories; Logic circuits; Low voltage; MOS integrated circuits; MOSFETs;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1970 International
  • Conference_Location
    Washington, DC, USA
  • Type

    conf

  • DOI
    10.1109/IEDM.1970.188299
  • Filename
    1476411