• DocumentCode
    3554399
  • Title

    Enhanced integrated injection logic performance using novel symmetrical cell topography

  • Author

    Ragonese, Louis J. ; Yang, Neng-Tze

  • Author_Institution
    General Electric Company, Syracuse, New York
  • Volume
    23
  • fYear
    1977
  • fDate
    1977
  • Firstpage
    166
  • Lastpage
    169
  • Abstract
    Contemporary I2L logic gate structures use an in-line topography for the multiple collector npn transistor. Decoupling effects between adjacent segments introduce a spread in the relative performance of the outputs with respect to gain, maximum collector current, and propagation delay. A novel cell layout, which enables the base contact and pnp injector to be symmetricaUy positioned relative to every collector in a multiple collector device, was developed. In controlled experiments, using an industry compatible fabrication process, symmetrical quad output cells demonstrated a factor-of-20 increase in the magnitude of useful npn collector current and the degree of gain uniformity among outputs.
  • Keywords
    Fabrication; Industrial control; Laboratories; Logic circuits; Logic gates; Parasitic capacitance; Propagation delay; Surfaces; Textile industry; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1977 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1977.189195
  • Filename
    1479275