DocumentCode
3554399
Title
Enhanced integrated injection logic performance using novel symmetrical cell topography
Author
Ragonese, Louis J. ; Yang, Neng-Tze
Author_Institution
General Electric Company, Syracuse, New York
Volume
23
fYear
1977
fDate
1977
Firstpage
166
Lastpage
169
Abstract
Contemporary I2L logic gate structures use an in-line topography for the multiple collector npn transistor. Decoupling effects between adjacent segments introduce a spread in the relative performance of the outputs with respect to gain, maximum collector current, and propagation delay. A novel cell layout, which enables the base contact and pnp injector to be symmetricaUy positioned relative to every collector in a multiple collector device, was developed. In controlled experiments, using an industry compatible fabrication process, symmetrical quad output cells demonstrated a factor-of-20 increase in the magnitude of useful npn collector current and the degree of gain uniformity among outputs.
Keywords
Fabrication; Industrial control; Laboratories; Logic circuits; Logic gates; Parasitic capacitance; Propagation delay; Surfaces; Textile industry; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1977 International
Type
conf
DOI
10.1109/IEDM.1977.189195
Filename
1479275
Link To Document