DocumentCode
3555015
Title
Virtual phase CCD technology
Author
Hynecek, J.
Volume
25
fYear
1979
fDate
1979
Firstpage
611
Lastpage
614
Abstract
In this article a new concept of a single phase CCD, called "virtual phase", is described. Virtual phase technology employs only a single level gate electrode structure. This technology represents a new approach to fabrication of large area CCD devices which have both high performance and high yield. An example of the application of virtual phase technology to the fabrication of a 490 × 328 CCD imager is presented, and several important design and performance parameters are discussed.
Keywords
Charge coupled devices; Clocks; Doping; Electrodes; Electrons; Fabrication; Implants; Instruments; Potential well; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1979 Internationa
Type
conf
DOI
10.1109/IEDM.1979.189698
Filename
1480563
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