DocumentCode
3555033
Title
Plasma-assisted etching for electron device fabrication
Author
Mogab, C.J.
Author_Institution
Bell Laboratories, Murray Hill, New Jersey, USA
Volume
25
fYear
1979
fDate
1979
Firstpage
675
Lastpage
675
Keywords
Anisotropic magnetoresistance; Chemical products; Electron devices; Etching; Fabrication; Gases; Plasma applications; Plasma devices; Solids; Surface discharges;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1979 Internationa
Type
conf
DOI
10.1109/IEDM.1979.189716
Filename
1480581
Link To Document