DocumentCode

3555045

Title

A novel liftoff process for VLSI using plasma deposition and etching

Author

Shibata, H. ; Iwasaki, H. ; Oku, T. ; Tarui, Y.

Author_Institution

VLSI Technical Research Association, Kawasaki, Japan

Volume

25

fYear

1979

fDate

1979

Firstpage

691

Lastpage

691

Keywords

Etching; Heat treatment; Plasma applications; Plasma devices; Resists; Shape; Space heating; Space technology; Stress; Very large scale integration;

fLanguage

English

Publisher

ieee

Conference_Titel

Electron Devices Meeting, 1979 Internationa

Type

conf

DOI

10.1109/IEDM.1979.189728

Filename

1480593