DocumentCode
3555093
Title
Low dielectric constant interconnect technology-a paradigm for interdisciplinary industry-university programs
Author
Gutmann, Ronald J. ; Isaac, Randall
Author_Institution
Center for Integrated Electron., Rensselaer Polytech. Inst., Troy, NY, USA
fYear
1991
fDate
12-14 Jun 1991
Firstpage
33
Lastpage
36
Abstract
A multidisciplinary vertically integrated and professional-interactive industry-university research program is described. Unique features of the program include joint definition (and guidance) of research directions and priorities, extensive interactions between university and industry researchers within similar disciplines, and extensive on-campus interaction between the disciplines involved. While the research program in ongoing, the authors believe that the successful interactions and research results to date indicate that a new paradigm for sizably scaled interdisciplinary industry-university programs is being established
Keywords
integrated circuit technology; metallisation; permittivity; research and development management; interdisciplinary industry-university programs; low dielectric constant interconnect technology; professional-interactive industry-university research; research program; vertically integrated; Cultural differences; Dielectric constant; Electrical capacitance tomography; Electronics industry; Government; Industrial electronics; Packaging; Technology transfer; Testing; Vehicles;
fLanguage
English
Publisher
ieee
Conference_Titel
University/Government/Industry Microelectronics Symposium, 1991. Proceedings., Ninth Biennial
Conference_Location
Melbourne, FL
ISSN
0749-6877
Print_ISBN
0-7803-0109-9
Type
conf
DOI
10.1109/UGIM.1991.148116
Filename
148116
Link To Document