• DocumentCode
    3555093
  • Title

    Low dielectric constant interconnect technology-a paradigm for interdisciplinary industry-university programs

  • Author

    Gutmann, Ronald J. ; Isaac, Randall

  • Author_Institution
    Center for Integrated Electron., Rensselaer Polytech. Inst., Troy, NY, USA
  • fYear
    1991
  • fDate
    12-14 Jun 1991
  • Firstpage
    33
  • Lastpage
    36
  • Abstract
    A multidisciplinary vertically integrated and professional-interactive industry-university research program is described. Unique features of the program include joint definition (and guidance) of research directions and priorities, extensive interactions between university and industry researchers within similar disciplines, and extensive on-campus interaction between the disciplines involved. While the research program in ongoing, the authors believe that the successful interactions and research results to date indicate that a new paradigm for sizably scaled interdisciplinary industry-university programs is being established
  • Keywords
    integrated circuit technology; metallisation; permittivity; research and development management; interdisciplinary industry-university programs; low dielectric constant interconnect technology; professional-interactive industry-university research; research program; vertically integrated; Cultural differences; Dielectric constant; Electrical capacitance tomography; Electronics industry; Government; Industrial electronics; Packaging; Technology transfer; Testing; Vehicles;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    University/Government/Industry Microelectronics Symposium, 1991. Proceedings., Ninth Biennial
  • Conference_Location
    Melbourne, FL
  • ISSN
    0749-6877
  • Print_ISBN
    0-7803-0109-9
  • Type

    conf

  • DOI
    10.1109/UGIM.1991.148116
  • Filename
    148116