DocumentCode
3555738
Title
A 1000V high voltage P-channel DSAMOS-IC
Author
Nakagawa, K. ; Ashida, T. ; Takeuchi, H. ; Fujii, K.
Author_Institution
Sharp Corporation, Tenri-City, Nara, Japan
Volume
28
fYear
1982
fDate
1982
Firstpage
72
Lastpage
75
Abstract
The object of this work is to develop a high voltage P-channel MOS IC for display driving. High voltage PMOS devices are suitable for current source drivers of plasma display, or vacuum fluorescent display. Low voltage circuits have been integrated with high voltage PMOS devices on a same chip. The high voltage PMOS transistor consists of lateral lightly doped drift region (P-) and a Diffusion-Self-Aligned (DSA) structure on a low impurity substrate (ν) and of multilayer field plates to ensure high reliability for the device. The device structure and process parameter are optimized by using process simulator "SUPREM II". The high voltage P-channel MO5 device provides 1000-V drain-breakdown voltage and can operate at 800-V drain-source voltage with 35mA drain current, on resistance as low as 1.5KΩ within an active area of 0.14mm2.
Keywords
Degradation; Electrodes; Fabrication; Logic; Nonhomogeneous media; Oxidation; Silicon; Space vector pulse width modulation; Temperature; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1982 International
Type
conf
DOI
10.1109/IEDM.1982.190215
Filename
1482749
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