• DocumentCode
    3555738
  • Title

    A 1000V high voltage P-channel DSAMOS-IC

  • Author

    Nakagawa, K. ; Ashida, T. ; Takeuchi, H. ; Fujii, K.

  • Author_Institution
    Sharp Corporation, Tenri-City, Nara, Japan
  • Volume
    28
  • fYear
    1982
  • fDate
    1982
  • Firstpage
    72
  • Lastpage
    75
  • Abstract
    The object of this work is to develop a high voltage P-channel MOS IC for display driving. High voltage PMOS devices are suitable for current source drivers of plasma display, or vacuum fluorescent display. Low voltage circuits have been integrated with high voltage PMOS devices on a same chip. The high voltage PMOS transistor consists of lateral lightly doped drift region (P-) and a Diffusion-Self-Aligned (DSA) structure on a low impurity substrate (ν) and of multilayer field plates to ensure high reliability for the device. The device structure and process parameter are optimized by using process simulator "SUPREM II". The high voltage P-channel MO5 device provides 1000-V drain-breakdown voltage and can operate at 800-V drain-source voltage with 35mA drain current, on resistance as low as 1.5KΩ within an active area of 0.14mm2.
  • Keywords
    Degradation; Electrodes; Fabrication; Logic; Nonhomogeneous media; Oxidation; Silicon; Space vector pulse width modulation; Temperature; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1982 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1982.190215
  • Filename
    1482749