DocumentCode
3556773
Title
Power supply voltage for future CMOS VLSI in half and sub micrometer
Author
Kakumu, Masakazu ; Kinugawa, Masaaki ; Hashimoto, Kazuhiko ; Matsunaga, Junichi
Author_Institution
Toshiba Corporation, Kawasaki, Japan
Volume
32
fYear
1986
fDate
1986
Firstpage
399
Lastpage
402
Abstract
The trade off between circuit performance and reliability of CMOS devices is theoretically and experimentally examined in detail down to sub micrometer gate length including various effects such as mobility degradation, reliability physics, parasitic capacitances and parasitic resistances. Based upon these cosideration, a new scaling scenario has been proposed to determine power supply voltage for half and lower sub micrometer CMOS devices. The new scaling scheme has been applied to O.6um CMOS device and it has been verified that the power supply voltage can be scaled down maintaining high circuit performance with high reliability.
Keywords
Circuit optimization; Circuit simulation; Degradation; Maintenance; Parasitic capacitance; Power supplies; Reliability theory; Semiconductor device reliability; Very large scale integration; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1986 International
Type
conf
DOI
10.1109/IEDM.1986.191202
Filename
1486460
Link To Document