• DocumentCode
    3556773
  • Title

    Power supply voltage for future CMOS VLSI in half and sub micrometer

  • Author

    Kakumu, Masakazu ; Kinugawa, Masaaki ; Hashimoto, Kazuhiko ; Matsunaga, Junichi

  • Author_Institution
    Toshiba Corporation, Kawasaki, Japan
  • Volume
    32
  • fYear
    1986
  • fDate
    1986
  • Firstpage
    399
  • Lastpage
    402
  • Abstract
    The trade off between circuit performance and reliability of CMOS devices is theoretically and experimentally examined in detail down to sub micrometer gate length including various effects such as mobility degradation, reliability physics, parasitic capacitances and parasitic resistances. Based upon these cosideration, a new scaling scenario has been proposed to determine power supply voltage for half and lower sub micrometer CMOS devices. The new scaling scheme has been applied to O.6um CMOS device and it has been verified that the power supply voltage can be scaled down maintaining high circuit performance with high reliability.
  • Keywords
    Circuit optimization; Circuit simulation; Degradation; Maintenance; Parasitic capacitance; Power supplies; Reliability theory; Semiconductor device reliability; Very large scale integration; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1986 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1986.191202
  • Filename
    1486460