DocumentCode
3557391
Title
Floating island and thick bottom oxide trench gate MOSFET (FITMOS) - a 60V ultra low on-resistance novel MOSFET with superior internal body diode
Author
Takaya, Hidefumi ; Miyagi, Kyosuke ; Hamada, Kimimori ; Okura, Yasushi ; Tokura, Norihito ; Kuroyanagi, Akira
Author_Institution
Toyota Motor Corp., Aichi, Japan
fYear
2005
fDate
23-26 May 2005
Firstpage
43
Lastpage
46
Abstract
A MOSFET structure named FITMOS has been successfully developed that exhibits record-low loss in the 60 volts breakdown voltage range. The breakdown voltage of 64 volts and specific on-resistance of 22mΩmm2 (Vgs=15V) this performance exceeds the unipolar limit (Chenming Hu, 1979). The device has a body diode with superior reverse recovery characteristics and exhibits an extremely small value for RonQgd. The distinctive feature of this device is the use of floating islands formed by self-alignment and trench gates with a thick oxide layer on the bottoms. This structure can also be used for the terminal portion of the device, so the increase in the number of fabrication processes is less than 5%. Moreover, the rate of nondefective gates in 3-by-4-mm rectangular devices on an 8-inch wafer is at least 98%.
Keywords
automotive electronics; power MOSFET; semiconductor device models; 15 V; 60 V; FITMOS; automotive electronics; floating islands; power MOSFET; self-alignment; superior internal body diode; superior reverse recovery; thick bottom oxide trench gate MOSFET; ultra low on-resistance MOSFET; Automobiles; Automotive engineering; Context modeling; Diodes; Fabrication; Immune system; MOSFET circuits; Semiconductor process modeling; Surges; Vehicles;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Semiconductor Devices and ICs, 2005. Proceedings. ISPSD '05. The 17th International Symposium on
Print_ISBN
0-7803-8890-9
Type
conf
DOI
10.1109/ISPSD.2005.1487946
Filename
1487946
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