DocumentCode
3557438
Title
Degraded blocking performance of 4H-SiC rectifiers under high dV/dt conditions
Author
Losee, P.A. ; Zhu, L. ; Chow, T.P. ; Bhat, I.B. ; Gutmann, R.J.
Author_Institution
Center for Integrated Electron., Rensselaer Polytech. Inst., Troy, NY, USA
fYear
2005
fDate
23-26 May 2005
Firstpage
219
Lastpage
222
Abstract
We present our pulsed blocking measurements of co-fabricated 4H-SiC Schottky, junction barrier Schottky (JBS), and pin diodes. Schottky diodes fail at pulsed voltages noticeably lower than their static values, while the pulsed leakage currents of JBS and pin diodes (along with commercial SiC rectifiers) remain below our measurable limits until the reverse voltage approaches the static breakdown. From experimental results and numerical simulations, the premature breakdown of the diodes is attributed to the slow response of deep levels associated with dopant implantation, which can leave high field points such as the edge of contacts unprotected under high dV/dt blocking conditions.
Keywords
Schottky diodes; p-i-n diodes; pulsed power supplies; rectifiers; semiconductor device breakdown; semiconductor doping; 4H-SiC rectifiers; JBS diodes; SiC; dopant implantation; junction barrier Schottky diodes; leakage currents; numerical simulations; pin diodes; pulsed blocking measurements; Breakdown voltage; Current measurement; Degradation; Electric breakdown; Leakage current; Numerical simulation; Pulse measurements; Rectifiers; Schottky diodes; Silicon carbide;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Semiconductor Devices and ICs, 2005. Proceedings. ISPSD '05. The 17th International Symposium on
Print_ISBN
0-7803-8890-9
Type
conf
DOI
10.1109/ISPSD.2005.1487990
Filename
1487990
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