• DocumentCode
    3565101
  • Title

    High performance silicon imaging arrays for cosmology, planetary sciences, & other applications

  • Author

    Nikzad, Shouleh ; Hoenk, Michael E. ; Hennessy, John ; Jewell, April D. ; Carver, Alexander G. ; Jones, Todd J. ; Cheng, Samuel L. ; Goodsall, Timothy ; Shapiro, Charles

  • Author_Institution
    Jet Propulsion Lab., California Inst. of Technol., Pasadena, CA, USA
  • fYear
    2014
  • Abstract
    High performance back-illuminated silicon arrays processed with precision atomic control of surface and interfaces are described. Precision atomic control of surface and interfaces parameters dictates quantum efficiency (QE), surface generated dark current, and cosmetic characteristics. Molecular Beam Epitaxy is used to grow delta layers and superlattice structures on the back surface of Si arrays. Photoelectron loss is greatly reduced and near 100% internal QE achieved. Photon losses are reduced by interface engineering using atomic layer deposition. Using these surface and interface treatments in different readout structures and formats creates a suite of devices with many applications. Si detectors spanning planetary science, astrophysics, medical diagnostics, machine vision, and commercial applications will be described.
  • Keywords
    atomic layer deposition; cosmology; elemental semiconductors; image sensors; molecular beam epitaxial growth; semiconductor superlattices; sensor arrays; silicon; surface treatment; QE; Si; astrophysics; atomic layer deposition; back-illuminated silicon imaging array; commercial application; cosmetic characteristics; cosmology application; delta layer; interface treatment; machine vision; medical diagnostics; molecular beam epitaxial growth; photoelectron loss; photon loss; precision surface atomic control; quantum efficiency; readout structure; spanning planetary science application; superlattice structure; surface generated dark current; surface treatment; Atomic layer deposition; CMOS integrated circuits; Coatings; Detectors; Imaging; Silicon; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2014 IEEE International
  • Type

    conf

  • DOI
    10.1109/IEDM.2014.7047027
  • Filename
    7047027