Large-scale fabrication of graphene-based electronic and MEMS devices

Graphene has been demonstrated great potential in electronic and optoelectronic applications. However, the zero band gap of graphene leads to the low on/off ratio in field effect transistors (FETs) and low optical wavelength selectivity in photo detectors. Moreover, the commonly used wet-transfer process for chemical vapor deposited (CVD) graphene could introduce contamination and defects that degrade the graphene device´s performance. These problems could be resolved if we could find a graphene ribbon fabrication method that could precisely control the width, edge structure, as well as registries (location, orientation) on the substrates. Here, we will showcase recent works on novel transfer-free and contaminant-free CVD methods for direct-growth of graphene nanoribbons and microribbons on dielectric substrates.