DocumentCode
3569794
Title
Microelectronic applications for RF sources and accelerators
Author
Tang, Cha-Mei
Author_Institution
Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
Volume
1
fYear
1995
Firstpage
70
Abstract
Lithographic microfabrication techniques have been applied to the development of cathodes. In this paper, we limit the discussion of microfabricated cathodes to gated field-emitter arrays, ferroelectric and microminiature therm-ionic vacuum cathodes. These cathodes have made significant advancements in the last few years. They share in common the potential of being temporally and spatially modulated at high frequencies by low voltages with low input power requirements. These properties not only provide opportunities to improve rf power sources and accelerators, but also provide opportunities to make new commercial products
Keywords
cathodes; ferroelectric devices; lithography; thermionic cathodes; vacuum microelectronics; RF accelerators; RF power sources; cathodes; ferroelectric cathodes; gated field-emitter arrays; lithographic microfabrication; microelectronic applications; microminiature thermionic vacuum cathodes; Acceleration; Cathodes; Electrons; Ferroelectric materials; Insulation; Laboratories; Microelectronics; Plasma accelerators; Radio frequency; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Particle Accelerator Conference, 1995., Proceedings of the 1995
Print_ISBN
0-7803-2934-1
Type
conf
DOI
10.1109/PAC.1995.504569
Filename
504569
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