• DocumentCode
    3569794
  • Title

    Microelectronic applications for RF sources and accelerators

  • Author

    Tang, Cha-Mei

  • Author_Institution
    Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
  • Volume
    1
  • fYear
    1995
  • Firstpage
    70
  • Abstract
    Lithographic microfabrication techniques have been applied to the development of cathodes. In this paper, we limit the discussion of microfabricated cathodes to gated field-emitter arrays, ferroelectric and microminiature therm-ionic vacuum cathodes. These cathodes have made significant advancements in the last few years. They share in common the potential of being temporally and spatially modulated at high frequencies by low voltages with low input power requirements. These properties not only provide opportunities to improve rf power sources and accelerators, but also provide opportunities to make new commercial products
  • Keywords
    cathodes; ferroelectric devices; lithography; thermionic cathodes; vacuum microelectronics; RF accelerators; RF power sources; cathodes; ferroelectric cathodes; gated field-emitter arrays; lithographic microfabrication; microelectronic applications; microminiature thermionic vacuum cathodes; Acceleration; Cathodes; Electrons; Ferroelectric materials; Insulation; Laboratories; Microelectronics; Plasma accelerators; Radio frequency; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Particle Accelerator Conference, 1995., Proceedings of the 1995
  • Print_ISBN
    0-7803-2934-1
  • Type

    conf

  • DOI
    10.1109/PAC.1995.504569
  • Filename
    504569