DocumentCode
3573137
Title
Impact of Polysilicon Depletion Effect on Circuit Performance for 0.35μ CMOS Technology
Author
Arora, Narain D. ; Rios, Rafael ; Huang, Cheng-Liang
Author_Institution
Digital Equipment Corporation, 77 Reed Road, Hudson, MA 01749
fYear
1994
Firstpage
369
Lastpage
372
Abstract
The impact of reduced polysilicon doping concentration Np on circuit performance is analyzed using a new polysilicon depletion model. SPICE simulations of inverter chains with different loadings predict that higher circuit delays are expected as Np is reduced. The performance degradation gets compounded when the gate oxide thickness tox is reduced, and/or substrate concentration Nb is increased. For a given tox and non-degenerate value of Np , lowering the channel length helps to reduce the polydepletion effect and hence circuit performance degradation. However, reducing the power supply, for low power operation, enhances the polydepletion effect.
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1994. ESSDERC '94. 24th European
Print_ISBN
863321579
Type
conf
Filename
5435738
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