DocumentCode
3607262
Title
Quantum Mechanical Modeling of Radiation-Induced Defect Dynamics in Electronic Devices
Author
Xiao Shen ; Puzyrev, Yevgeniy S. ; Fleetwood, Daniel M. ; Schrimpf, Ronald D. ; Pantelides, Sokrates T.
Author_Institution
Dept. of Phys. & Astron., Vanderbilt Univ., Nashville, TN, USA
Volume
62
Issue
5
fYear
2015
Firstpage
2169
Lastpage
2180
Abstract
Density functional theory (DFT) has emerged as a powerful tool to model defect properties and dynamics at the quantum mechanical level. Results from targeted DFT calculations can provide valuable insight into the atomistic nature of radiation-induced defect phenomena in microelectronics. This review describes the foundations of DFT, its implementations, and defect calculations. Illustrative examples from recent studies are presented in which DFT calculations, combined with experiments, have led to new insights into the microscopic processes that lead to the observed radiation response. These include GaN/AlGaN HEMTs, proton-induced interface-trap formation at the Si-SiO2 interface, and the role of hydrogen in enhanced low-dose-rate sensitivity (ELDRS) in bipolar devices and ICs.
Keywords
III-V semiconductors; aluminium compounds; density functional theory; gallium compounds; high electron mobility transistors; hydrogen; integrated circuit modelling; radiation hardening (electronics); semiconductor device models; silicon compounds; wide band gap semiconductors; DFT calculations; ELDRS; GaN-AlGaN; H2; HEMT; Si-SiO2; bipolar devices; density functional theory; electronic devices; enhanced low-dose-rate sensitivity; high electron mobility transistors; hydrogen; microelectronics; microscopic processes; proton-induced interface-trap formation; quantum mechanical modeling; radiation response; radiation-induced defect dynamics; radiation-induced defect phenomena; Approximation methods; Correlation; Discrete Fourier transforms; Electric potential; Mathematical model; Photonic band gap; Wave functions; Atomic scale modeling; defects; density functional theory; hydrogen; interface traps; oxide traps; radiation effects;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.2015.2470665
Filename
7283668
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