DocumentCode
3609113
Title
Transconductance improvement technique for bulk-driven OTA in nanometre CMOS process
Author
Xiao Zhao ; Huajun Fang ; Tong Ling ; Jun Xu
Author_Institution
Sch. of Geophys. & Inf. Technol., China Univ. of Geosci., Beijing, China
Volume
51
Issue
22
fYear
2015
Firstpage
1758
Lastpage
1759
Abstract
A transconductance improvement technique for a bulk-driven operational transconductance amplifier (OTA) working in the weak inversion region is presented. Using the quasi-floating gate method, the proposed technique achieves larger transconductance improvement than conventional approaches with the CMOS technologies scaling. Moreover, its enhanced performance is at no expense of the power budget. Simulated on UMC 180 nm technology, the results demonstrate that the proposed bulk-driven OTA achieves more than two times gain-bandwidth improvement than that of the traditional counterpart with the same power.
Keywords
CMOS integrated circuits; operational amplifiers; CMOS technologies scaling; UMC 180 nm technology; bulk-driven OTA; bulk-driven operational transconductance amplifier; nanometre CMOS process; quasi-floating gate method; size 180 nm; transconductance improvement technique; weak inversion region;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el.2015.1559
Filename
7308098
Link To Document