• DocumentCode
    3609113
  • Title

    Transconductance improvement technique for bulk-driven OTA in nanometre CMOS process

  • Author

    Xiao Zhao ; Huajun Fang ; Tong Ling ; Jun Xu

  • Author_Institution
    Sch. of Geophys. & Inf. Technol., China Univ. of Geosci., Beijing, China
  • Volume
    51
  • Issue
    22
  • fYear
    2015
  • Firstpage
    1758
  • Lastpage
    1759
  • Abstract
    A transconductance improvement technique for a bulk-driven operational transconductance amplifier (OTA) working in the weak inversion region is presented. Using the quasi-floating gate method, the proposed technique achieves larger transconductance improvement than conventional approaches with the CMOS technologies scaling. Moreover, its enhanced performance is at no expense of the power budget. Simulated on UMC 180 nm technology, the results demonstrate that the proposed bulk-driven OTA achieves more than two times gain-bandwidth improvement than that of the traditional counterpart with the same power.
  • Keywords
    CMOS integrated circuits; operational amplifiers; CMOS technologies scaling; UMC 180 nm technology; bulk-driven OTA; bulk-driven operational transconductance amplifier; nanometre CMOS process; quasi-floating gate method; size 180 nm; transconductance improvement technique; weak inversion region;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el.2015.1559
  • Filename
    7308098