DocumentCode
3609275
Title
Surface-Controlled Metal Oxide Resistive Memory
Author
Jr-Jian Ke ; Namura, Kyoko ; Retamal, Jose R. D. ; Chih-Hsiang Ho ; Minamitake, Haruhiko ; Tzu-Chiao Wei ; Dung-Sheng Tsai ; Chun-Ho Lin ; Suzuki, Motofumi ; Jr-Hau He
Author_Institution
Comput., Electr. & Math. Sci. & Eng. Div., King Abdullah Univ. of Sci. & Technol., Thuwal, Saudi Arabia
Volume
36
Issue
12
fYear
2015
Firstpage
1307
Lastpage
1309
Abstract
To explore the surface effect on resistive random-access memory (ReRAM), the impact of surface roughness on the characteristics of ZnO ReRAM was studied. The thickness-independent resistance and the higher switching probability of ZnO ReRAM with rough surfaces indicate the importance of surface oxygen chemisorption on the switching process. Furthermore, the improvements in switching probability, switching voltage, and resistance distribution observed for ReRAM with rough surfaces can be attributed to the stable oxygen adatoms under various ambience conditions. The findings validate the surface-controlled stability and the uniformity of ReRAM and can serve as the guideline for developing practical device applications.
Keywords
II-VI semiconductors; chemisorption; resistive RAM; surface roughness; wide band gap semiconductors; zinc compounds; ZnO; ZnO ReRAM; resistance distribution; resistive random-access memory; stable oxygen adatoms; surface effect; surface oxygen chemisorption; surface roughness; surface-controlled metal oxide resistive memory; surface-controlled stability; switching probability; switching voltage; thickness-independent resistance; Random access memory; Rough surfaces; Surface roughness; Zinc oxide; ZnO; oxygen chemisorption; resistive random-access memory; surface roughness;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2015.2493343
Filename
7310859
Link To Document