DocumentCode
3619165
Title
Trends and challenges in VLSI technology scaling towards 100nm
Author
S. Rusu
Author_Institution
Intel Corporation, Santa Clara, CA
fYear
2001
fDate
6/23/1905 12:00:00 AM
Firstpage
194
Lastpage
196
Keywords
"Very large scale integration","MOSFETs","Subthreshold current","Moore´s Law","Lithography","Integrated circuit interconnections","Ultraviolet sources","Delay","Frequency","Degradation"
Publisher
ieee
Conference_Titel
Solid-State Circuits Conference, 2001. ESSCIRC 2001. Proceedings of the 27th European
Type
conf
Filename
1471366
Link To Document