• DocumentCode
    3619476
  • Title

    Three-Dimensional Simulation of SiO2 Profiles from TEOS-Sourced Remote Microwave Plasma-Enhanced Chemical Vapor Deposition

  • Author

    E. Bear;J. Lorenz;H. Ryssel

  • Author_Institution
    Fraunhofer Institut fü
  • fYear
    1998
  • fDate
    6/20/1905 12:00:00 AM
  • Firstpage
    340
  • Lastpage
    343
  • Keywords
    "Plasma simulation","Plasma chemistry","Chemical vapor deposition","Surface topography","Plasma materials processing","Computational modeling","Iterative algorithms","Semiconductor device manufacture","Calibration","Software algorithms"
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 1998. Proceeding of the 28th European
  • Print_ISBN
    2-86332-234-6
  • Type

    conf

  • Filename
    1503558
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3619476