• DocumentCode
    3619658
  • Title

    Modeling Facet Formation for Non-Planar Thermal Oxidation of Silicon

  • Author

    V. Moroz;C. Dachs;A. Schoonveld

  • Author_Institution
    Avant! Corporation, Fremont, USA
  • fYear
    2001
  • fDate
    6/23/1905 12:00:00 AM
  • Firstpage
    371
  • Lastpage
    374
  • Keywords
    "Oxidation","Silicon","Shape measurement","Crystallography","MOSFET circuits","Monitoring","Stress","Anisotropic magnetoresistance","Leakage current","Thermal degradation"
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 2001. Proceeding of the 31st European
  • Print_ISBN
    2-914601-01-8
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2001.195278
  • Filename
    1506660
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3619658