• DocumentCode
    3635145
  • Title

    A 6 device SOI new technology for mixed analog-digital and rad-hard applications

  • Author

    J.P. Blanc;J. Bonaime;E. Delevoye;J. de Pontcharra;J. Gautier;F. Martin;R. Truche

  • Author_Institution
    LETI, (CEA-Technologies avanc?es), DMEL, CENG, B.P. 85X, 38041 Grenoble Cedex, France
  • fYear
    1993
  • Firstpage
    679
  • Lastpage
    682
  • Abstract
    DMILL technology is being developed for very rad-hard analog-digital applications, such as space and military circuits or as electronics for the future generation of high energy collider (LHC, CERN, Geneva) [3]. Both CMOS and junction (JFET and bipolar) transistors arc needed. A new process has been integrated, based on a 1.2 μm thick silicon film on insulator (SIMOX plus epitaxy), a complete dielectric isolation and low temperature process. The main feature is that six different components are fabricated on the same wafer, taking into account the 12 volts supply voltage constraint for some analog applications. The first electrical characteristics are presented in this paper. The optimization capabilities of such an hardened CBi-CJ-CMOS technology are discussed.
  • Keywords
    "Analog-digital conversion","Radiation hardening","Space technology","CMOS technology","Silicon on insulator technology","Integrated circuit technology","Large Hadron Collider","Semiconductor films","Dielectrics and electrical insulation","Epitaxial growth"
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1993. ESSDERC ´93. 23rd European
  • Print_ISBN
    2-86332-135-8
  • Type

    conf

  • Filename
    5435587