• DocumentCode
    3639073
  • Title

    Using the Coherence Correlation Interferometry (CCI) technique for study topography of the C-Ni films deposited on porous silicon

  • Author

    M. Suchańska;M. Makrenek;J. Świderski

  • Author_Institution
    Division of Photonics and Electronic Nanomaterials, Kielce University of Technology, Al. 1000-Lecia PP No 7, 25-314, Poland
  • Volume
    2
  • fYear
    2010
  • Firstpage
    367
  • Lastpage
    370
  • Abstract
    Possibilities of applications Coherence Correlation Interferometry technique for topological studies of microporous materials on example C-Ni films deposited on porous silicon are discussed.
  • Keywords
    "Scanning electron microscopy","Silicon","Films","Correlation","Coherence"
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Conference (CAS), 2010 International
  • ISSN
    1545-827X
  • Print_ISBN
    978-1-4244-5783-0
  • Type

    conf

  • DOI
    10.1109/SMICND.2010.5649092
  • Filename
    5649092
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3639073