• DocumentCode
    3641884
  • Title

    Si ohmic contacts on N-type SiC

  • Author

    Stanislav Cichoň;Petr Macháč;Bohumil Barda;Marie Kudrnová

  • Author_Institution
    Department of Solid State Engineering, Institute of Chemical Technology, Prague, Technická
  • fYear
    2011
  • fDate
    5/1/2011 12:00:00 AM
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    Widespread Ni/SiC contact after annealing at high temperatures provides good ohmic contact. We managed to prepare Si/SiC annealed ohmic contacts with comparable qualities as Ni/SiC ones. However, the main benefit of these Si/SiC ohmic contacts lies in that they retain their ohmic properties even after they are etched off which brings grounds for promising secondary contacts. Etched contacts were analyzed by XPS and surface composition alteration was observed.
  • Keywords
    "Annealing","Silicon","Silicon carbide","Contacts","Conductivity","Temperature measurement","Substrates"
  • Publisher
    ieee
  • Conference_Titel
    Interconnect Technology Conference and 2011 Materials for Advanced Metallization (IITC/MAM), 2011 IEEE International
  • ISSN
    pending
  • Print_ISBN
    978-1-4577-0503-8
  • Type

    conf

  • DOI
    10.1109/IITC.2011.5940323
  • Filename
    5940323