DocumentCode
3641884
Title
Si ohmic contacts on N-type SiC
Author
Stanislav Cichoň;Petr Macháč;Bohumil Barda;Marie Kudrnová
Author_Institution
Department of Solid State Engineering, Institute of Chemical Technology, Prague, Technická
fYear
2011
fDate
5/1/2011 12:00:00 AM
Firstpage
1
Lastpage
3
Abstract
Widespread Ni/SiC contact after annealing at high temperatures provides good ohmic contact. We managed to prepare Si/SiC annealed ohmic contacts with comparable qualities as Ni/SiC ones. However, the main benefit of these Si/SiC ohmic contacts lies in that they retain their ohmic properties even after they are etched off which brings grounds for promising secondary contacts. Etched contacts were analyzed by XPS and surface composition alteration was observed.
Keywords
"Annealing","Silicon","Silicon carbide","Contacts","Conductivity","Temperature measurement","Substrates"
Publisher
ieee
Conference_Titel
Interconnect Technology Conference and 2011 Materials for Advanced Metallization (IITC/MAM), 2011 IEEE International
ISSN
pending
Print_ISBN
978-1-4577-0503-8
Type
conf
DOI
10.1109/IITC.2011.5940323
Filename
5940323
Link To Document