• DocumentCode
    3664743
  • Title

    Abnormal off-state current in multiple silicon nanowire MOS transistors

  • Author

    Qanqun Yu;Xuan Feng;Hei Wong;Kuniyuki Kakushima;Hiroshi Iwai

  • Author_Institution
    Department of Information Sciences and Electronic Engineering, Zhejiang University, Hangzhou, China
  • fYear
    2015
  • fDate
    6/1/2015 12:00:00 AM
  • Firstpage
    435
  • Lastpage
    438
  • Abstract
    This work reports the observation of abnormally large off-state currents in silicon nanowire transistors with gate length less than 2.5 μm. As the gate lengths as well as the source/drain doping level were well beyond the punchthrough conditions, we ascribed this observation to the charge transport along the corners/boundaries of the nanowires. Temperature dependent characteristics were also investigated. The threshold voltage decreases linearly as the temperature increases which is ascribed to the charge states at oxide/nanowire interfaces. Corner and surface of nanowire thus play an important role for ultra-short nanowire transistors and that calls for shape of nanowire optimation for device design.
  • Keywords
    "Logic gates","Threshold voltage","Silicon","MOSFET","Nanoscale devices"
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Solid-State Circuits (EDSSC), 2015 IEEE International Conference on
  • Print_ISBN
    978-1-4799-8362-9
  • Type

    conf

  • DOI
    10.1109/EDSSC.2015.7285144
  • Filename
    7285144