DocumentCode
3664743
Title
Abnormal off-state current in multiple silicon nanowire MOS transistors
Author
Qanqun Yu;Xuan Feng;Hei Wong;Kuniyuki Kakushima;Hiroshi Iwai
Author_Institution
Department of Information Sciences and Electronic Engineering, Zhejiang University, Hangzhou, China
fYear
2015
fDate
6/1/2015 12:00:00 AM
Firstpage
435
Lastpage
438
Abstract
This work reports the observation of abnormally large off-state currents in silicon nanowire transistors with gate length less than 2.5 μm. As the gate lengths as well as the source/drain doping level were well beyond the punchthrough conditions, we ascribed this observation to the charge transport along the corners/boundaries of the nanowires. Temperature dependent characteristics were also investigated. The threshold voltage decreases linearly as the temperature increases which is ascribed to the charge states at oxide/nanowire interfaces. Corner and surface of nanowire thus play an important role for ultra-short nanowire transistors and that calls for shape of nanowire optimation for device design.
Keywords
"Logic gates","Threshold voltage","Silicon","MOSFET","Nanoscale devices"
Publisher
ieee
Conference_Titel
Electron Devices and Solid-State Circuits (EDSSC), 2015 IEEE International Conference on
Print_ISBN
978-1-4799-8362-9
Type
conf
DOI
10.1109/EDSSC.2015.7285144
Filename
7285144
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