• DocumentCode
    3664798
  • Title

    Broadband highly linear high isolation SPDT switch IC with floating body technique in 180-nm CMOS

  • Author

    Xiao Xu;Xin Yang;Taufiq Alif Kurniawan;Toshihiko Yoshimasu

  • Author_Institution
    The Graduate School of Information, Production and Systems, Waseda University, 2-7 Hibikino Wakamatsu-ku Kitakyushu-city, Fukuoka, Japan
  • fYear
    2015
  • fDate
    6/1/2015 12:00:00 AM
  • Firstpage
    653
  • Lastpage
    655
  • Abstract
    This paper presents a broadband single-pole double-throw (SPDT) switch IC in a 180-nm CMOS process. Floating body technique and stacked nMOSFETs are utilized to improve the power handling capability and isolation performance. The fabricated SPDT switch IC has exhibited an input referred 0.5-dB compression point of 21.8 dBm, an isolation of 42.4 dB and an insertion loss of 1.2 dB for transmit mode at an operation frequency of 5.0 GHz. The SPDT switch IC has an insertion loss of 2.1 dB and a return loss of 10.6 dB for receive mode at 5.0 GHz.
  • Keywords
    "Conferences","Electron devices","Solid state circuits"
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Solid-State Circuits (EDSSC), 2015 IEEE International Conference on
  • Print_ISBN
    978-1-4799-8362-9
  • Type

    conf

  • DOI
    10.1109/EDSSC.2015.7285200
  • Filename
    7285200