DocumentCode
3666482
Title
Repetitive high stability modulator for PAL-XFEL
Author
S. S. Park;S. H. Kim;S. J. Kwon;B.-J. Lee;H. S. Lee;H. S. Kang;I. S. Ko;D. S. Kim;H. S. Shin
Author_Institution
Pohang Accelerator Laboratory, Pohang City, Kyungbuk 790-784, Korea
fYear
2014
fDate
6/1/2014 12:00:00 AM
Firstpage
520
Lastpage
522
Abstract
The Pohang Accelerator Laboratory (PAL) had started the 10 GeV PAL-XFEL project from 2011. The PAL-XFEL needs a highly stable electron beam. The very stable beam voltage of a klystron- modulator is essential to provide the stable acceleration field for an electron beam. Thus, the modulator system for the XFEL requires less than 50 ppm PFN voltage stability. To get this high stability on the modulator system, the inverter type HVPS is a pivot component. And the modulator needs lower noise and smart. We discuss the measurement of the stability and the test results of the pulse modulator system.
Keywords
"Modulation","Voltage measurement","Thermal stability","Temperature measurement","Laser stability","Inverters","Power supplies"
Publisher
ieee
Conference_Titel
Power Modulator and High Voltage Conference (IPMHVC), 2014 IEEE International
Print_ISBN
978-1-4673-7323-4
Type
conf
DOI
10.1109/IPMHVC.2014.7287326
Filename
7287326
Link To Document