DocumentCode
3667935
Title
Extending drift-diffusion paradigm into the era of FinFETs and nanowires
Author
Munkang Choi;Victor Moroz;Lee Smith; Joanne Huang
Author_Institution
Synopsys, Mountain View, California, USA
fYear
2015
Firstpage
242
Lastpage
245
Abstract
This paper presents a feasibility study that the drift-diffusion model can capture the ballistic transport of FinFETs and nanowires with a simple model extension. For FinFETs, Monte Carlo simulation is performed and the ballistic mobility is calibrated to linear & saturation currents. It is validated that the calibrated model works over a wide range of channel length and channel stress. The ballistic mobility model is then applied to a nanowire with 5nm design rules. Finally, the technology scaling trend of the ballistic ratio is explored.
Keywords
"Nanowires","FinFETs","Monte Carlo methods","Logic gates","Stress","Mathematical model"
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices (SISPAD), 2015 International Conference on
ISSN
1946-1569
Print_ISBN
978-1-4673-7858-1
Type
conf
DOI
10.1109/SISPAD.2015.7292304
Filename
7292304
Link To Document