• DocumentCode
    3667935
  • Title

    Extending drift-diffusion paradigm into the era of FinFETs and nanowires

  • Author

    Munkang Choi;Victor Moroz;Lee Smith; Joanne Huang

  • Author_Institution
    Synopsys, Mountain View, California, USA
  • fYear
    2015
  • Firstpage
    242
  • Lastpage
    245
  • Abstract
    This paper presents a feasibility study that the drift-diffusion model can capture the ballistic transport of FinFETs and nanowires with a simple model extension. For FinFETs, Monte Carlo simulation is performed and the ballistic mobility is calibrated to linear & saturation currents. It is validated that the calibrated model works over a wide range of channel length and channel stress. The ballistic mobility model is then applied to a nanowire with 5nm design rules. Finally, the technology scaling trend of the ballistic ratio is explored.
  • Keywords
    "Nanowires","FinFETs","Monte Carlo methods","Logic gates","Stress","Mathematical model"
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices (SISPAD), 2015 International Conference on
  • ISSN
    1946-1569
  • Print_ISBN
    978-1-4673-7858-1
  • Type

    conf

  • DOI
    10.1109/SISPAD.2015.7292304
  • Filename
    7292304