DocumentCode
3667954
Title
Channel-potential based compact model of Double-Gate Tunneling FETs considering channel-length scaling
Author
Peng Wu;Jinyu Zhang;Li Zhang;Zhiping Yu
Author_Institution
Institute of Microelectronics, Tsinghua University, Beijing 100084, China
fYear
2015
Firstpage
317
Lastpage
320
Abstract
A channel-potential based compact I-V model for Double-Gate Tunneling FETs (DG-TFETs) incorporating channel length scaling is presented. The model covers both sub-threshold and strong-inversion operation regimes and achieves good agreement with TCAD results while the channel length is scaled down to 10nm. The effect and mechanism of channel length scaling on the performance of DG-TFETs are investigated. As expected, the scaling down of channel length deteriorates off-state and sub-threshold performance of DG-TFETs and leads to worse output saturation characteristics. However, our compact model provides a quick and quantitative means to assess the impact of TFET scaling on the device performance.
Keywords
"Junctions","Tunneling"
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices (SISPAD), 2015 International Conference on
ISSN
1946-1569
Print_ISBN
978-1-4673-7858-1
Type
conf
DOI
10.1109/SISPAD.2015.7292323
Filename
7292323
Link To Document