• DocumentCode
    3667965
  • Title

    Impact of deep p-well structure on single event latchup in bulk CMOS

  • Author

    Takashi Kato;Hideya Matsuyama

  • Author_Institution
    Reliability &
  • fYear
    2015
  • Firstpage
    365
  • Lastpage
    368
  • Abstract
    The effect of a deep p-well structure on radiation-induced single event latchup is studied through three-dimensional numerical simulations. Our simulation results show that the deep p-well structure effectively prevents single event latchup even in the case that well taps are significantly far from the source region of a CMOS device. We demonstrate that the deep p-well structure creates an additional conduction path for holes and suppresses the potential perturbation in a p-well.
  • Keywords
    "CMOS integrated circuits","Ions","Semiconductor process modeling","Doping","Neutrons","Solid modeling","Electric potential"
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices (SISPAD), 2015 International Conference on
  • ISSN
    1946-1569
  • Print_ISBN
    978-1-4673-7858-1
  • Type

    conf

  • DOI
    10.1109/SISPAD.2015.7292335
  • Filename
    7292335