DocumentCode
3667965
Title
Impact of deep p-well structure on single event latchup in bulk CMOS
Author
Takashi Kato;Hideya Matsuyama
Author_Institution
Reliability &
fYear
2015
Firstpage
365
Lastpage
368
Abstract
The effect of a deep p-well structure on radiation-induced single event latchup is studied through three-dimensional numerical simulations. Our simulation results show that the deep p-well structure effectively prevents single event latchup even in the case that well taps are significantly far from the source region of a CMOS device. We demonstrate that the deep p-well structure creates an additional conduction path for holes and suppresses the potential perturbation in a p-well.
Keywords
"CMOS integrated circuits","Ions","Semiconductor process modeling","Doping","Neutrons","Solid modeling","Electric potential"
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices (SISPAD), 2015 International Conference on
ISSN
1946-1569
Print_ISBN
978-1-4673-7858-1
Type
conf
DOI
10.1109/SISPAD.2015.7292335
Filename
7292335
Link To Document