• DocumentCode
    3667977
  • Title

    A moving mesh method for device simulation

  • Author

    Koichi Fukuda;Hidehiro Asai;Junichi Hattori;Hiroo Koshimoto;Tsutomu Ikegami

  • Author_Institution
    National Institute of Advanced Industrial Science and Technology (AIST), Japan
  • fYear
    2015
  • Firstpage
    409
  • Lastpage
    412
  • Abstract
    A moving mesh method for semiconductor device simulation is developed which effectively compromises accuracies without increasing mesh number. In this method, mesh positions are shifted referring to the solution of the previous bias condition, or to the Newton corrections. The method is applied to solve PN-junctions and MOSFETs. The method provides an effective way to cover the changes of carrier distributions depending on bias conditions. The algorithm is simple and effective, and can be widely used.
  • Keywords
    "Junctions","Accuracy","MOSFET","Semiconductor process modeling","Predictive models","Impurities"
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices (SISPAD), 2015 International Conference on
  • ISSN
    1946-1569
  • Print_ISBN
    978-1-4673-7858-1
  • Type

    conf

  • DOI
    10.1109/SISPAD.2015.7292347
  • Filename
    7292347