DocumentCode
3667977
Title
A moving mesh method for device simulation
Author
Koichi Fukuda;Hidehiro Asai;Junichi Hattori;Hiroo Koshimoto;Tsutomu Ikegami
Author_Institution
National Institute of Advanced Industrial Science and Technology (AIST), Japan
fYear
2015
Firstpage
409
Lastpage
412
Abstract
A moving mesh method for semiconductor device simulation is developed which effectively compromises accuracies without increasing mesh number. In this method, mesh positions are shifted referring to the solution of the previous bias condition, or to the Newton corrections. The method is applied to solve PN-junctions and MOSFETs. The method provides an effective way to cover the changes of carrier distributions depending on bias conditions. The algorithm is simple and effective, and can be widely used.
Keywords
"Junctions","Accuracy","MOSFET","Semiconductor process modeling","Predictive models","Impurities"
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices (SISPAD), 2015 International Conference on
ISSN
1946-1569
Print_ISBN
978-1-4673-7858-1
Type
conf
DOI
10.1109/SISPAD.2015.7292347
Filename
7292347
Link To Document