• DocumentCode
    3695353
  • Title

    Surface structure study and structure determination of (√3 × √3)R 30° phase of Si-adsorption on Ni(111) by LEED

  • Author

    Md. Sazzadur Rahman;Mohammad Tawheed Kibria;Takeshi Nakagawa;Seigi Mizuno

  • Author_Institution
    Dept. of Molecular and Material Sciences, Kyushu University, Fukuoka, Japan
  • fYear
    2015
  • fDate
    6/1/2015 12:00:00 AM
  • Firstpage
    1
  • Lastpage
    5
  • Abstract
    The phase evolution of Si on Ni (111) was studied by LEED and AES. A new phase of Si on Ni (111) was found along with the previously reported (√3 × √3)R 30° phase. The surface structure of (√3 × √3)R 30° phase had determined, with chemical composition of Ni2Si, by using low-energy electron diffraction (LEED) analysis. The obtained nickel silicide would be helpful for understanding the formation of Schottky barrier at semiconductor-metal interface.
  • Keywords
    "Nickel","Silicon","Annealing","Surface structures","Atomic layer deposition","Silicides"
  • Publisher
    ieee
  • Conference_Titel
    Informatics, Electronics & Vision (ICIEV), 2015 International Conference on
  • Type

    conf

  • DOI
    10.1109/ICIEV.2015.7334025
  • Filename
    7334025
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3695353