• DocumentCode
    3748122
  • Title

    Non volatile memory evolution and revolution

  • Author

    Paolo Cappelletti

  • Author_Institution
    Micron Technology - Via C. Olivetti 2, 20864 Agrate Brianza, Italy
  • fYear
    2015
  • Abstract
    For over 40 years, the evolution of Non Volatile Memories has been mostly based on the floating gate MOS transistor. We have successfully succeeded in scaling this wonderful device below 20nm but we are now approaching the limit. It is time for disruptive innovations, either integrating the same basic device in a vertical structure or moving to totally different device concepts. This paper analyzes the different alternatives in relation to their areas of application.
  • Keywords
    "Three-dimensional displays","Nonvolatile memory","Random access memory","Flash memories","Phase change materials","MOSFET","Technological innovation"
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2015 IEEE International
  • Electronic_ISBN
    2156-017X
  • Type

    conf

  • DOI
    10.1109/IEDM.2015.7409666
  • Filename
    7409666