DocumentCode
3748122
Title
Non volatile memory evolution and revolution
Author
Paolo Cappelletti
Author_Institution
Micron Technology - Via C. Olivetti 2, 20864 Agrate Brianza, Italy
fYear
2015
Abstract
For over 40 years, the evolution of Non Volatile Memories has been mostly based on the floating gate MOS transistor. We have successfully succeeded in scaling this wonderful device below 20nm but we are now approaching the limit. It is time for disruptive innovations, either integrating the same basic device in a vertical structure or moving to totally different device concepts. This paper analyzes the different alternatives in relation to their areas of application.
Keywords
"Three-dimensional displays","Nonvolatile memory","Random access memory","Flash memories","Phase change materials","MOSFET","Technological innovation"
Publisher
ieee
Conference_Titel
Electron Devices Meeting (IEDM), 2015 IEEE International
Electronic_ISBN
2156-017X
Type
conf
DOI
10.1109/IEDM.2015.7409666
Filename
7409666
Link To Document