DocumentCode
3758473
Title
Zinc oxide thin film fabricated by thermal evaporation method for water splitting application
Author
M. S. Islam;M. F. Hossain;S. M. A. Razzak;M. M. Haque;M. N. I. Khan
Author_Institution
Department of Electrical Electronic Engineering, Rajshahi University of Engineering and Technology, Bangladesh
fYear
2015
Firstpage
253
Lastpage
256
Abstract
The aim of this paper is to fabricate zinc oxide (ZnO) photoelectrode by a modified thermal evaporation system for water splitting application. At first, zinc thin film has been deposited on bare fluorine doped tin oxide (FTO) glass substrate by a modified thermal evaporation system with chamber pressure 0.05 mbar, source temperature 700°C, source substrate distance 3 cm and deposition time 5 min. For obtaining ZnO thin film, the prepared zinc film is annealed at 500°C for 2 hours in atmosphere. The prepared ZnO film is characterized and investigated the photoelectrochemical performance and suitability for splitting of water.
Keywords
"Films","Photonics","Optical diffraction","Zinc oxide","II-VI semiconductor materials","Thermal stability","Elementary particle vacuum"
Publisher
ieee
Conference_Titel
Electrical & Electronic Engineering (ICEEE), 2015 International Conference on
Print_ISBN
978-1-5090-1939-7
Type
conf
DOI
10.1109/CEEE.2015.7428270
Filename
7428270
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