DocumentCode
376481
Title
Prototyped XY stages driving EB mastering for a high density optical recording
Author
Hosaka, S. ; Koyanagi, H. ; Katoh, K. ; Isshiki, F. ; Suzuki, T. ; Miyamoto, M. ; Miyauchi, Y. ; Arimoto, A. ; Nishida, T.
Author_Institution
Central Res. Lab., Hitachi Ltd., Kokubunji, Japan
Volume
2
fYear
2001
fDate
15-19 July 2001
Abstract
Prototyped XY-stages driving electron beam (EB) writing system is developed to research the possibility to write fine patterns. High density optical recording pattern with 25 Gbit/in/sup 2/ is demonstrated. It is also clear that EB writing (drawing) system has a potential to achieve a required fine pattern for 100 Gbit/in/sup 2/.
Keywords
electron beam lithography; optical disc storage; EB mastering; fine pattern writing system; high density optical recording; optical ROM mastering; optical disc storage; prototyped XY stages; Control systems; Electron beams; Optical control; Optical design; Optical interferometry; Optical recording; Prototypes; Scanning electron microscopy; Spirals; Writing;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2001. CLEO/Pacific Rim 2001. The 4th Pacific Rim Conference on
Conference_Location
Chiba, Japan
Print_ISBN
0-7803-6738-3
Type
conf
DOI
10.1109/CLEOPR.2001.970781
Filename
970781
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