• DocumentCode
    3779728
  • Title

    A CMOS A/D converter on laser recrystallized SOI with controlling the crystal growth direction

  • Author

    S. Kuaunoki;K. Sugahara;T. Nisliimura;T. Kumamoto;M. Nakaya;N. Yaiawa;Y. Horiba

  • Author_Institution
    LSI R & D Laboratory, Mitsubishi Electric Corporation, 4-1 Misuhara, Itami 664 Japan
  • fYear
    1987
  • fDate
    5/1/1987 12:00:00 AM
  • Firstpage
    107
  • Lastpage
    108
  • Abstract
    The new laser recrystallization technique which enabled to form the (001) textured SOI with few crystalline defects was developed, and successfully applied for CMOS ICs with analog function for the first time. This technique will widely contribute to the higher performance and the larger scale integration of CMOS-ICs and/or 3-D ICs.
  • Keywords
    "Lasers","MOSFET","Crystals","Silicon","Films","Surface treatment","Analog-digital conversion"
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1987. SymVLSITech 1987. Symposium on
  • Print_ISBN
    978-1-5090-3151-1
  • Type

    conf

  • Filename
    7508754
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3779728