• DocumentCode
    3779731
  • Title

    Double diffraction alignment method using checker grating

  • Author

    M. Tabata;T. Tojo

  • Author_Institution
    VLSI Research Center, Toshiba Corporation, 1, Komukai-Toshiba-cho, Saiwai-ku, Kawasaki, 210, Japan
  • fYear
    1987
  • fDate
    5/1/1987 12:00:00 AM
  • Firstpage
    11
  • Lastpage
    12
  • Abstract
    An interferometric alignment method, using checker grating construction, has been newly demonstrated for submicron lithography. This alignment method has satisfied resist process and lithography system requirements and has the following characteristics.
  • Keywords
    "Gratings","Resists","Optical interferometry","Lenses","Interferometric lithography","Laser beams"
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1987. SymVLSITech 1987. Symposium on
  • Print_ISBN
    978-1-5090-3151-1
  • Type

    conf

  • Filename
    7508757
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3779731