• DocumentCode
    3809015
  • Title

    Degradation of Bacteria by Weakly Ionized Highly Dissociated Radio-Frequency Oxygen Plasma

  • Author

    Zoran Vratnica;Danijela Vujosevic;Uros Cvelbar;Miran Mozetic

  • Author_Institution
    Plasma Lab., Joef Stefan Inst., Ljubljana
  • Volume
    36
  • Issue
    4
  • fYear
    2008
  • Firstpage
    1300
  • Lastpage
    1301
  • Abstract
    Inductively coupled oxygen plasma was used to study the degradation of Bacillus stearothermophilus. Bacteria were deposited on a silicon wafer substrate and treated by plasma for different periods. The first effect was the removal of the envelope - a protective coating that the bacteria developed during growing. After removing the envelope (capsule), slow etching of the cell wall was observed. Further treatment resulted in the gradual removal of the cell wall, and after 240 s, only ashes remained. The images of plasma interaction steps during the bacteria degradation are presented.
  • Keywords
    "Degradation","Microorganisms","Radio frequency","Oxygen","Plasma applications","Silicon","Protection","Coatings","Etching","Ash"
  • Journal_Title
    IEEE Transactions on Plasma Science
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2008.926841
  • Filename
    4544506