DocumentCode
3809015
Title
Degradation of Bacteria by Weakly Ionized Highly Dissociated Radio-Frequency Oxygen Plasma
Author
Zoran Vratnica;Danijela Vujosevic;Uros Cvelbar;Miran Mozetic
Author_Institution
Plasma Lab., Joef Stefan Inst., Ljubljana
Volume
36
Issue
4
fYear
2008
Firstpage
1300
Lastpage
1301
Abstract
Inductively coupled oxygen plasma was used to study the degradation of Bacillus stearothermophilus. Bacteria were deposited on a silicon wafer substrate and treated by plasma for different periods. The first effect was the removal of the envelope - a protective coating that the bacteria developed during growing. After removing the envelope (capsule), slow etching of the cell wall was observed. Further treatment resulted in the gradual removal of the cell wall, and after 240 s, only ashes remained. The images of plasma interaction steps during the bacteria degradation are presented.
Keywords
"Degradation","Microorganisms","Radio frequency","Oxygen","Plasma applications","Silicon","Protection","Coatings","Etching","Ash"
Journal_Title
IEEE Transactions on Plasma Science
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2008.926841
Filename
4544506
Link To Document