• DocumentCode
    3810680
  • Title

    Locally one-dimensional approach to diffusion process simulation in nonplanar domains

  • Author

    S. Mitrovic;S. Mijalkovic;N. Stojadinovic

  • Author_Institution
    Fac. of Electron. Eng., Nis Univ., Serbia
  • Volume
    31
  • Issue
    20
  • fYear
    1995
  • Firstpage
    1788
  • Lastpage
    1789
  • Abstract
    A new approach to diffusion process simulation in 2-D domains with nonplanar and moving boundaries, which combines the orthogonal numerical co-ordinate transformation associated with the alternative direction implicit (ADI) solving procedure and geometric splitting of the impurity diffusion equation into locally one-dimensional problems is proposed.
  • Keywords
    "Semiconductor process modeling","Semiconductor device doping","Diffusion processes"
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19951175
  • Filename
    469256
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3810680