DocumentCode
3818133
Title
Exponentially fitted discretization schemes for diffusion process simulation on coarse grids
Author
S. Mijalkovic
Author_Institution
Fac. of Electron. Eng., Nis Univ., Serbia
Volume
15
Issue
5
fYear
1996
Firstpage
484
Lastpage
492
Abstract
This paper examines formulation of the discretization schemes for diffusion process simulation that allow coarse grid spacings in the areas of exponentially varying concentrations and fluxes. The method of integral identities is used as a common framework for exponential fitting of both the finite difference and finite element schemes. An exponentially fitted finite difference scheme, with discrete flux terms analogous to those used in Scharfetter-Gummel scheme is justified. An extension of the integral identities in projection form to higher dimensions and a corresponding multidimensional exponentially fitted finite element scheme are proposed. Two-dimensional test computations show clear superiority of the exponentially fitted schemes over the standard approaches as well as robustness of a new finite element scheme regarding irregular grid geometry.
Keywords
"Diffusion processes","Integral equations","Finite difference methods","Multidimensional systems","Finite element methods","Computational modeling","Iron","Semiconductor process modeling","Testing","Grid computing"
Journal_Title
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Publisher
ieee
ISSN
0278-0070
Type
jour
DOI
10.1109/43.506136
Filename
506136
Link To Document