• DocumentCode
    3846421
  • Title

    Electroforming and Resistance Switching Characteristics of Silver-Doped MSQ With Inert Electrodes

  • Author

    Roland Rosezin;Matthias Meier;Uwe Breuer;Carsten Kügeler;Rainer Waser

  • Author_Institution
    Institute of Solid State Research and JARA---Fundamentals for Future Information Technology, Forschungszentrum Jü
  • Volume
    10
  • Issue
    2
  • fYear
    2011
  • Firstpage
    338
  • Lastpage
    343
  • Abstract
    This paper reports on the resistance switching effect in silver-doped methylsilsesquioxane (MSQ) thin films with Pt top and bottom electrodes. Silver is thermally diffused into MSQ films for different times and the results prove that silver ions (or other oxidizable metal ions) are required in the system, but not necessarily as one of the two electrodes. SEM investigations at horizontal cells (gap width 15-100 nm) show the formation of metallic agglomerations in the gap. The forming process is found to be electric-field driven and the filament resistance is determined to be 30 Ω/nm. Under the assumption of conical-shaped filament growth, the diameter of a filament is calculated to 13.5 nm, which is in agreement with the SEM observations. Memory device related tests on 100 × 100 nm2 cross junctions show unipolar switching up to 2000 times and retention at 85°C for at least 6 × 104 s.
  • Keywords
    "Electrodes","Silver","Solids","Transistors","Nonvolatile memory","Costs","Platinum","Metal-insulator structures","Information technology","Permission"
  • Journal_Title
    IEEE Transactions on Nanotechnology
  • Publisher
    ieee
  • ISSN
    1536-125X
  • Type

    jour

  • DOI
    10.1109/TNANO.2010.2041669
  • Filename
    5409574