DocumentCode
3850835
Title
Etching of Bacterial Capsule and Cell Wall by Oxygen Plasma Afterglow
Author
Kristina Elersic;Ita Junkar;Ales Spes;Daniela Vujosevic;Zoran Vratnica;Uroš Cvelbar
Author_Institution
Jozef Stefan Institute, Ljubljana, Slovenia
Volume
39
Issue
11
fYear
2011
Firstpage
2972
Lastpage
2973
Abstract
Sterilization of delicate materials by gaseous plasma represents an interesting task for plasma scientists. While sporulating bacteria are rather resistant to weak plasma treatments, some bacteria are destroyed even in an afterglow. A representative type of nonsporulating bacteria is Staphylococcus aureus. Such bacteria are destroyed by treatment with mostly neutral O atoms found in oxygen plasma afterglow. The degradation steps are followed by atomic force microscopy. The bacteria remain vital for about 2 min of treatment at the O flux of about 1.3 ×1022 m-2·s-1. The bacterial capsule is removed in about 2 min. Once the capsule is removed, degradation of the cell wall occurs, causing bacterial death.
Keywords
"Plasmas","Microorganisms","Degradation","Substrates","Discharges","Atomic layer deposition"
Journal_Title
IEEE Transactions on Plasma Science
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2011.2159024
Filename
5957314
Link To Document