• DocumentCode
    3850835
  • Title

    Etching of Bacterial Capsule and Cell Wall by Oxygen Plasma Afterglow

  • Author

    Kristina Elersic;Ita Junkar;Ales Spes;Daniela Vujosevic;Zoran Vratnica;Uroš Cvelbar

  • Author_Institution
    Jozef Stefan Institute, Ljubljana, Slovenia
  • Volume
    39
  • Issue
    11
  • fYear
    2011
  • Firstpage
    2972
  • Lastpage
    2973
  • Abstract
    Sterilization of delicate materials by gaseous plasma represents an interesting task for plasma scientists. While sporulating bacteria are rather resistant to weak plasma treatments, some bacteria are destroyed even in an afterglow. A representative type of nonsporulating bacteria is Staphylococcus aureus. Such bacteria are destroyed by treatment with mostly neutral O atoms found in oxygen plasma afterglow. The degradation steps are followed by atomic force microscopy. The bacteria remain vital for about 2 min of treatment at the O flux of about 1.3 ×1022 m-2·s-1. The bacterial capsule is removed in about 2 min. Once the capsule is removed, degradation of the cell wall occurs, causing bacterial death.
  • Keywords
    "Plasmas","Microorganisms","Degradation","Substrates","Discharges","Atomic layer deposition"
  • Journal_Title
    IEEE Transactions on Plasma Science
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2011.2159024
  • Filename
    5957314